专利名称:Polymer
发明人:木元 孝和,二井 知紀,松田 恭彦,寺山 公将,錦織 克
聡
申请号:JP2017226986申请日:20171127公开号:JP6512269B2公开日:20190515
摘要:[project] provides the polymer ingredient of the linear resin combination ofradiation of defective inhibition. [solution] has cycloaliphatic ring etc. with the firststructure unit including methyl ring and the methyl base including fourth stage carbon orin base, the second structure unit containing acid dissociation including α-A Jier acrylate,and the weight for meeting formula (A) contains the fit linear resin combination ofradiation. (X1-X2)/X2 ≥0.03(A) (X1 is melted out in curve in GPC, and value (More) X2 forbecoming the content conjunction of the 1st structure unit of the full structural units ofthe polymer of the parts below ab% to region-wide area from the accumulation areaarea of high molecular weight side is value (fuzzy) [selection is schemed] Fig. 1 of c~d %
申请人:JSR株式会社
地址:東京都港区東新橋一丁目9番2号
国籍:JP
代理人:天野 一規
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