专利名称：Method and apparatus for measuring thin
film thickness using x-ray
发明人：Shi Surk Kim,Joo Hye Kim,Sang Bong
Lee,Seong Uk Lee
申请号：US13893395申请日：20130514公开号：US09644956B2公开日：20170509
专利附图：
摘要：Provided is an apparatus and method for measuring a thickness of thin filmusing x-ray where a thickness of a thin film of nanometer_(nm) level can be accurately
measured without destructing an target sample, through determination of thickness ofthin film of the target sample, by determining a calibration curve by comparing adifference of intensities of signals scattered by a special component included in a baselayer of the reference sample.
申请人：NANO CMS Co., Ltd.
地址：Cheonan-si KR
国籍：KR
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