SUBSTRATE MANUFACTURING METHOD

专利名称：SUBSTRATE MANUFACTURING METHOD发明人：IKENO, Junichi,YAMADA, Yohei,SUZUKI,

Hideki,NOGUCHI, Hitoshi

申请号：EP19161290.2申请日：20190307公开号：EP3536437A1公开日：20190911

专利附图：

摘要：A substrate manufacturing method capable of easily obtaining a thinmagnesium oxide single crystal substrate is provided. A first step is performed whichdisposes a condenser (14) for condensing a laser beam (B) on an irradiated surface (20r)

of a magnesium oxide single crystal member (20) in a non-contact manner. A second stepis performed which forms processing mark lines in parallel by irradiating the laser beam(B) to the surface (20r) of the single crystal substrate (20) under designated irradiationconditions to condense the laser beam (B) into an inner portion of the single crystalsubstrate (20) while moving the condenser (14) and the single crystal substrate (20)relative to each other in a two-dimensional manner. A third step is performed whichforms new processing mark lines between the adjacent irradiation lines in the secondstep to allow planar separation, by irradiating the laser beam (B) to the surface (20r) ofthe single crystal substrate (20) under designated irradiation conditions to condense thelaser beam (B) into an inner portion of the single crystal substrate (20) while moving thecondenser (14) and the single crystal substrate (20) relative to each other in a two-dimensional manner.

申请人：Shin-Etsu Polymer Co., Ltd.,Shin-Etsu Chemical Co., Ltd.,National UniversityCorporation Saitama University

地址：1-9, Kanda-Sudacho Chiyoda-ku Tokyo 101-0041 JP,6-1, Ohtemachi 2-chome,Chiyoda-ku, Tokyo 100-0004 JP,255, Shimo-Okubo Sakura-ku Saitama City, Saitama 338-8570 JP

国籍：JP,JP,JP

代理机构：SSM Sandmair

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